Plasma-assisted Manufacturing
Electrochemical impedance spectroscopy (EIS) is a powerful analytical technique used to measure the impedance of an electrochemical system over a range of frequencies. By applying a small sinusoidal voltage and measuring the resulting current, EIS provides insights into the electrochemical processes occurring at the interfaces and within the materials. This technique is particularly relevant for assessing the properties of plasma-sprayed coatings, helping to evaluate their durability, conductivity, and overall performance in various applications.
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